LanheTek, founded in 2020, is a leading supplier of MOCVD and CVD equipment for semiconductors.

    LanheTek has developed series of MOCVD and CVD tools on basis of four classical platforms of technologies, i.e., DR (double rotation), CS (coupled showerhead), HR (horizontal flow) and C (vertical flow with high rotation speed). These tools are widely applied for epitaxial growth of materials and devices of Indium Phosphide (InP), Gallium Arsenide (GaAs) and their alloys; Gallium Nitride (GaN) and Nitride alloys; Silicon Carbide (SiC), Gallium Oxide (Ga₂O₃), customized metal and 2D films of Molybdenum Disulfide (MoS₂), Tungsten Diselenide (WSe₂) as well as graphene.

    LanheTek's experts team supports strong innovation, engineering and service for world-class research, exploration and industrial mass-production.